Intel Lithography
Intel manufacturing processes. Major = full node, minor = enhanced revision of that node.
Major versions
| Major | Generation | Since | Versions |
|---|---|---|---|
v0 | 10 µm PMOS | 1971 | 1 |
v1 | 6 µm NMOS | 1974 | 1 |
v2 | 3 µm HMOS | 1976 | 1 |
v3 | 1.5 µm CHMOS III | 1982 | 1 |
v4 | 1 µm CHMOS IV | 1989 | 1 |
v5 | 800 nm BiCMOS | 1992 | 1 |
v6 | 600 nm BiCMOS | 1994 | 1 |
v7 | 350 nm | 1995 | 1 |
v8 | 250 nm | 1997 | 1 |
v9 | 180 nm | 1999 | 1 |
v10 | 130 nm | 2001 | 1 |
v11 | 90 nm | 2003 | 1 |
v12 | 65 nm | 2005 | 1 |
v13 | 45 nm | 2007 | 1 |
v14 | 32 nm | 2010 | 1 |
v15 | 22 nm | 2012 | 1 |
v16 | 14 nm | 2014 | 3 |
v17 | 10 nm | 2018 | 4 |
v18 | Intel 4 | 2023 | 2 |
v19 | Intel 20A | 2024 | 2 |
All 27 versions
| Version | Intel name | Class | Codename | Released |
|---|---|---|---|---|
v0.0.1 | 10 µm PMOS | 10um | 1971 | |
v1.0.0 | 6 µm NMOS | 6um | 1974 | |
v2.0.0 | 3 µm HMOS | 3um | 1976 | |
v3.0.0 | 1.5 µm CHMOS III | 1500nm | 1982 | |
v4.0.0 | 1 µm CHMOS IV | 1000nm | 1989 | |
v5.0.0 | 800 nm BiCMOS | 800nm | 1992 | |
v6.0.0 | 600 nm BiCMOS | 600nm | 1994 | |
v7.0.0 | 350 nm | 350nm | 1995 | |
v8.0.0 | 250 nm | 250nm | 1997 | |
v9.0.0 | 180 nm | 180nm | 1999 | |
v10.0.0 | 130 nm | 130nm | 2001 | |
v11.0.0 | 90 nm | 90nm | 2003 | |
v12.0.0 | 65 nm | 65nm | 2005 | |
v13.0.0 | 45 nm | 45nm | 2007 | |
v14.0.0 | 32 nm | 32nm | 2010 | |
v15.0.0 | 22 nm | 22nm | 2012 | |
v16.0.0 | 14 nm | 14nm | 2014 | |
v16.1.0 | 14 nm+ | 14nm+ | 2016 | |
v16.2.0 | 14 nm++ | 14nm++ | 2017 | |
v17.0.0 | 10 nm | 10nm | 2018 | |
v17.1.0 | 10 nm+ | 10nm+ | 2019 | |
v17.2.0 | 10 nm SuperFin | 10nm SuperFin | 2020 | |
v17.3.0 | Intel 7 | Intel 7 | 2021 | |
v18.0.0 | Intel 4 | Intel 4 | 2023 | |
v18.1.0 | Intel 3 | Intel 3 | 2024 | |
v19.0.0 | Intel 20A | Intel 20A | 2024 | |
v19.1.0 | Intel 18A | Intel 18A | 2025 |